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JINXING MATECH CO LTD
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel
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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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Brand Name : JINXING

Model Number : Zirconium Sputtering Target

Certification : ISO 9001

Place of Origin : China

MOQ : 1kg

Price : 20～100USD/kg

Payment Terms : L/C, D/A, D/P, T/T, Western Union

Supply Ability : 100000kgs/M

Delivery Time : 10～25 work days

Packaging Details : Plywood case

Material : Zirconium Zr702

Process : HIP , CIP

Size : Customized

Application : PVD Coating

Density : 6.506g/cm3

Shape : Round , Plate , Tube Sputtering target

Grain Size : Fine Grain Size

Purity : 99.5% , 99.95%

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Zirconium Rotatable Sputtering Target

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Description

JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material incluidng ( Ti Titanium, TiAl, TiSi, TiZr , Zr Zirconium , Cr Chrome, Mo, W Tungsten, WTi , Cu, Ni, Ta, Nb ) .

  • Hot Pressing
  • Hot Isostatic Pressing (HIP)
  • Cold Isostatic Pressing (CIP)
  • Vacuum Sintering
  • Induction Melting
  • Vacuum Melting & Casting
  • Arc Melting
  • Electron-Beam Melting
  • Plasma Spraying
  • Co-Precipitation

JINXING has developed a complete line of rotary cathode sputtering targets. Materials are either continuously cast, extruded, HIP'ed or plasma sprayed to provide technological advances in rotary design. In addition, unique profiles can be developed for specific applications to provide targets for better wear characterization, longer life, unique physical characteristics or altered metallurgical properties.

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Grades: R60702, 99.2%min
Purity: 99.5%
Purity: 99.95% Hf<300ppm or Hf<4.5%)
Shape: Round Shape , Tube Shape and Plate Shape.

Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density


Product Tags:

Zirconium Rotatable Sputtering Target

      

High Density Rotatable Sputtering Target

      

Zr 702 Sputtering Target

      
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density Manufactures

Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density Images

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